Japan, Oct. 30 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'RESIST MATERIAL AND PATTERN FORMING METHOD.' Other related details are as follows:

Application Number: JP,2022-042868

Category (FI): G03F7/038,601,G03F7/20,501,G03F7/039,601,G03F7/004,503@A,C08F12/14,C08F20/26,C09K3/00@K,G03F7/004,501,G03F7/20,521

Stage: Grant (IP right document published.)

Filing Date: March 17, 2022

Publication Date: Sept. 29, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....