Japan, July 6 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'REFLECTION TYPE PHOTOMASK BLANK, AND PRODUCTION METHOD OF REFLECTION TYPE PHOTOMASK.' Other related details are as follows:
Application Number: JP,2023-092797
Category (FI): G03F1/24,G03F1/80
Stage: Grant (IP right granted following substantive examination.)
Filing Date: June 6, 2023
Publication Date: Dec. 18, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
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