Japan, July 31 -- APPLIED MATERIALS INC has got intellectual property rights for 'PULSED PLASMA (DC/RF) DEPOSITION OF HIGH QUALITY C FILM FOR PATTERNING.' Other related details are as follows:
Application Number: JP,2023-119193
Category (FI): H01L21/302,105@A,H01L21/314@A,C23C16/26,H10P14/69@A,H10P50/20,105@A,H10P50/28,H10P50/26,H10P50/24
Stage: Grant (IP right granted following substantive examination.)
Filing Date: July 21, 2023
Publication Date: Oct. 24, 2023
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication....