Japan Intellectual Property Rights: PROCESSING CHAMBER WITH PLURALITY OF PLASMA UNITS

Japan, July 14 -- APPLIED MATERIALS INC has got intellectual property rights for 'PROCESSING CHAMBER WITH PLURALITY OF PLASMA UNITS.' Other related details are as follows:

Application Number: JP,2025-069336

Category (FI): H01L21/304,645@C,H10P50/20,101@G,H10P14/60,101@B,H01L21/302,101@G,H01L21/31@B,H10P70/00,105@C

Stage: PROBLEM TO BE SOLVED: To provide a processing apparatus that includes both a remote plasma unit and a direct plasma unit and a process.SOLUTION: In a processing tool 200, a processing chamber 201 that accommodates a semiconductor substrate 230 in a processing region 215 includes a remote plasma unit 206 and a direct plasma unit 208. One of the remote plasma unit and the direct plasma unit generates remote plasma and the ...