Japan, Sept. 14 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'POSITIVE RESIST MATERIAL AND PATTERN FORMING METHOD.' Other related details are as follows:

Application Number: JP,2023-156655

Category (FI): G03F7/20,501,G03F7/20,521,C08F20/10,C07D251/34@D,C07D405/12,C07D251/34@H,C07C271/52,C07C271/58,G03F7/039,601,G03F7/004,501

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Sept. 22, 2023

Publication Date: April 30, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....