Japan Intellectual Property Rights: POLISHING PAD, AND MANUFACTURING METHOD AND POLISHING METHOD OF CONDUCTIVE SEMICONDUCTOR SUBSTRATE

Japan, Feb. 6 -- SUMITOMO CHEMICAL CO LTD has got intellectual property rights for 'POLISHING PAD, AND MANUFACTURING METHOD AND POLISHING METHOD OF CONDUCTIVE SEMICONDUCTOR SUBSTRATE.' Other related details are as follows:

Application Number: JP,2021-133059

Category (FI): B24B37/24@B,B24B37/26,B24B37/00@Z,B23H3/04@Z,H10P52/00@D,H10P52/40,H10P52/00@Q,H10P52/00@U,H10P52/20,H01L21/304,622@F

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Aug. 18, 2021

Publication Date: March 3, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

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