Japan Intellectual Property Rights: PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Japan, May 21 -- KIOXIA CORP has got intellectual property rights for 'PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE.' Other related details are as follows:

Application Number: JP,2022-147666

Category (FI): H10D30/69,H01L21/302,101@B,H01L21/302,101@H,H01L27/11582,H01L29/78,371,H05H1/46@M,H10B43/27,H10D30/01,501,H10P50/20,101@B,H10P50/20,101@H,H10P50/28,H10D30/68

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Sept. 16, 2022

Publication Date: March 29, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....