Japan Intellectual Property Rights: PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING SUBSTRATE HAVING PATTERNED RESIN FILM

Japan, July 6 -- TOKYO OHKA KOGYO CO LTD has got intellectual property rights for 'PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING SUBSTRATE HAVING PATTERNED RESIN FILM.' Other related details are as follows:

Application Number: JP,2022-087094

Category (FI): G03F7/20,521,G03F7/20,501,G03F7/032,501,G03F7/027,502,G03F7/004,501,G03F7/075,501

Stage: Grant (IP right granted following substantive examination.)

Filing Date: May 27, 2022

Publication Date: Dec. 7, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....