Japan, March 23 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, PATTERN FORMATION METHOD, AND LIGHT-EMITTING ELEMENT.' Other related details are as follows:

Application Number: JP,2022-160776

Category (FI): C08F2/44@A,C08F292/00,G02B5/20,G03F7/004,501,G03F7/004,503@A,G03F7/004,512,G03F7/038,601,G03F7/075,521,H01L33/50,H10H20/851

Stage: Grant (IP right document published.)

Filing Date: Oct. 5, 2022

Publication Date: April 17, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....