Japan, Jan. 28 -- ROHM & HAAS ELECTRONIC MATERIALS LLC has got intellectual property rights for 'PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS.' Other related details are as follows:

Application Number: JP,2023-115602

Category (FI): C08F20/10,G03F7/039,601,G03F7/004,503@A,G03F7/20,501,G03F7/20,521

Stage: Grant (IP right document published.)

Filing Date: July 14, 2023

Publication Date: Jan. 31, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....