Japan Intellectual Property Rights: PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK

Japan, Sept. 18 -- TOPPAN PHOTOMASK CO LTD has got intellectual property rights for 'PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK.' Other related details are as follows:

Application Number: JP,2022-013549

Category (FI): G03F1/32,G03F1/80,G03F1/74,G03F1/54,G03F1/29

Stage: PROBLEM TO BE SOLVED: To provide a phase shift mask having less haze defect, that is, can sufficiently suppress generation of haze, and a method for manufacturing the phase shift mask.SOLUTION: Exposure light of the wavelength 200nm or less is applied to a phase shift mask 100 according to the embodiment and the phase shift mask is equipped with a circuit pattern, and comprises: a substrate 11; a phase shift film 12 which is formed on the substrate 11, ...