Japan, Jan. 28 -- TOPPAN PHOTOMASK CO LTD has got intellectual property rights for 'PHASE SHIFT MASK AND METHOD FOR MANUFACTURING PHASE SHIFT MASK.' Other related details are as follows:

Application Number: JP,2022-013548

Category (FI): G03F1/29,G03F1/32,G03F1/48,G03F1/54,G03F1/74,G03F1/80

Stage: Grant (IP right document published.)

Filing Date: Jan. 31, 2022

Publication Date: Aug. 10, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....