Japan, Oct. 29 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'ONIUM SALT, RESIST COMPOSITION, AND PATTERN FORMING METHOD.' Other related details are as follows:

Application Number: JP,2022-111933

Category (FI): G03F7/20,521,G03F7/20,501,G03F7/039,601,G03F7/038,601,G03F7/004,503@A,G03F7/004,501,C09K3/00@K,C07C205/59,C07C211/63,C07C25/00,C07C381/12,C07C65/21@C,C07C65/26,C07D333/54,C07D333/76

Stage: Grant(IP right document published.)

Filing Date: July 12, 2022

Publication Date: Jan. 24, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....