Japan, June 16 -- ASAHI KASEI CORP has got intellectual property rights for 'NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE.' Other related details are as follows:
Application Number: JP,2022-186520
Category (FI): C08G73/12,C08L79/08@A,G03F7/004,505,G03F7/029,G03F7/031,H01L23/12,501@P,H10W70/62,500,G03F7/027,514
Stage: Grant (IP right granted following substantive examination.)
Filing Date: Nov. 22, 2022
Publication Date: June 3, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication....