Japan, June 16 -- TOKYO OHKA KOGYO CO LTD has got intellectual property rights for 'NEGATIVE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD.' Other related details are as follows:

Application Number: JP,2022-114987

Category (FI): G03F7/20,521,G03F7/038,503,G03F7/004,503@Z

Stage: Grant (IP right granted following substantive examination.)

Filing Date: July 19, 2022

Publication Date: Jan. 31, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....