Japan Intellectual Property Rights: METHOD FOR PRODUCING SILICA SOL, POLISHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR WAFER AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

Japan, Jan. 20 -- MITSUBISHI CHEMICAL CORP has got intellectual property rights for 'METHOD FOR PRODUCING SILICA SOL, POLISHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR WAFER AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE.' Other related details are as follows:

Application Number: JP,2021-150494

Category (FI): H01L21/304,622@D,H10P52/40,H10P52/00@T,H10P52/00@H,H10P52/00@F,B24B37/00@H,H01L21/304,622@B,C09K3/14,550@D,C01B33/141,C09K3/14,550@Z

Stage: Grant (IP right document published.)

Filing Date: Sept. 15, 2021

Publication Date: March 28, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

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