Japan Intellectual Property Rights: METHOD FOR CLEANING SEMICONDUCTOR MANUFACTURING EQUIPMENT COMPONENT AND METHOD FOR MANUFACTURING SEMICONDUCTOR MANUFACTURING EQUIPMENT COMPONENT USING THE SAME

Japan, June 25 -- NGK SPARK PLUG CO LTD has got intellectual property rights for 'METHOD FOR CLEANING SEMICONDUCTOR MANUFACTURING EQUIPMENT COMPONENT AND METHOD FOR MANUFACTURING SEMICONDUCTOR MANUFACTURING EQUIPMENT COMPONENT USING THE SAME.' Other related details are as follows:

Application Number: JP,2021-011710

Category (FI): H01L21/304,647@A,H01L21/304,642@E,H01L21/304,642@Z,H10P70/00,107@A,H10P70/00,102@Z,H10P70/00,102@E,B08B3/12@B

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Jan. 28, 2021

Publication Date: Aug. 9, 2022

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

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