Japan, Aug. 14 -- SICRYSTAL GMBH has got intellectual property rights for 'METHOD AND DEVICE FOR THERMAL POST-PROCESSING ON AT LEAST ONE SiC BULK SINGLE CRYSTAL.' Other related details are as follows:
Application Number: JP,2024-027533
Category (FI): C30B33/02,C30B23/06,C30B29/36@A
Stage: Grant (IP right granted following substantive examination.)
Filing Date: Feb. 27, 2024
Publication Date: Oct. 7, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication....