Japan Intellectual Property Rights: FILM DEPOSITION METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND FILM DEPOSITION APPARATUS

Japan, Oct. 30 -- TOKYO ELECTRON LTD has got intellectual property rights for 'FILM DEPOSITION METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND FILM DEPOSITION APPARATUS.' Other related details are as follows:

Application Number: JP,2021-146056

Category (FI): H01L21/28,301@R,C23C16/42,H10D64/62@S,H10D64/62@R,H10D64/01@M,H01L21/285@C,H01L21/28,301@S

Stage: Grant (IP right document published.)

Filing Date: Sept. 8, 2021

Publication Date: March 20, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....