Japan, Nov. 7 -- AGC INC has got intellectual property rights for 'EUV LITHOGRAPHY SUBSTRATE, IDENTIFICATION METHOD OF EUV LITHOGRAPHY SUBSTRATE, AND PRODUCTION METHOD OF EUV LITHOGRAPHY SUBSTRATE.' Other related details are as follows:

Application Number: JP,2021-199567

Category (FI): G03F1/60,G03F1/24

Stage: Grant (IP right document published.)

Filing Date: Dec. 8, 2021

Publication Date: June 20, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....