Japan, Oct. 30 -- MITSUBISHI CHEMICAL CORP has got intellectual property rights for 'ETCHING COMPOSITION, ETCHING METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING GATE-ALL-AROUND TRANSISTOR.' Other related details are as follows:
Application Number: JP,2024-145378
Category (FI): H01L21/308@B
Stage: Grant (IP right document published.)
Filing Date: Aug. 27, 2024
Publication Date: Oct. 31, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
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