Japan Intellectual Property Rights: CYCLOHEXANEDICARBOXYLIC ACID-BASED COMPOUND, CYCLOHEXANE DIMETHANOL, POLYESTER RESIN, AND METHOD FOR PRODUCING POLYCARBONATE RESIN

Japan, March 24 -- MITSUBISHI CHEMICAL CORP has got intellectual property rights for 'CYCLOHEXANEDICARBOXYLIC ACID-BASED COMPOUND, CYCLOHEXANE DIMETHANOL, POLYESTER RESIN, AND METHOD FOR PRODUCING POLYCARBONATE RESIN.' Other related details are as follows:

Application Number: JP,2022-145363

Category (FI): B01J23/42@Z,B01J23/46,301@Z,B01J23/58@Z,B01J23/63@Z,B01J31/28@Z,C07B61/00,300,C07C27/02,C07C29/136,C07C31/20@Z,C07C51/09,C07C51/36,C07C61/09,C07C67/03,C07C67/303,C07C69/013@B,C08G63/199,C08G64/02

Stage: Grant (IP right document published.)

Filing Date: Sept. 13, 2022

Publication Date: Oct. 6, 2023

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

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