Japan Intellectual Property Rights: CURABLE RESIN COMPOSITION FOR SILICON-CONTAINING RESIST, PATTERN FORMING METHOD, METHOD FOR PRODUCING IMPRINT MOLD, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

Japan, Sept. 30 -- DAINIPPON PRINTING CO LTD has got intellectual property rights for 'CURABLE RESIN COMPOSITION FOR SILICON-CONTAINING RESIST, PATTERN FORMING METHOD, METHOD FOR PRODUCING IMPRINT MOLD, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE.' Other related details are as follows:

Application Number: JP,2025-179689

Category (FI): G03F7/40,511,B29C59/02@B,H01L21/30,502@D

Stage: Grant (IP right granted following substantive examination.)

Filing Date: Oct. 24, 2025

Publication Date: Jan. 21

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....