Japan, Jan. 20 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'COMPOSITION FOR FORMING METAL OXIDE FILM, PATTERN FORMATION METHOD AND METAL OXIDE FILM FORMATION METHOD.' Other related details are as follows:
Application Number: JP,2022-110193
Category (FI): G03F7/40,511,C08L71/02,G03F7/11,502,G03F7/26,511,G03F7/40,521,G03F7/11,503,G03F7/38,501,C08G65/38,C08K3/22
Stage: Grant (IP right granted following substantive examination.)
Filing Date: July 8, 2022
Publication Date: Jan. 19, 2024
The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100
Disclaimer: Curated by HT Syndication....