Japan, Feb. 24 -- DISCO ABRASIVE SYST LTD has got intellectual property rights for 'CLEANING METHOD OF PLASMA ETCHING DEVICE.' Other related details are as follows:
Application Number: JP,2022-131077
Category (FI): H01L21/302,101@H,H10P50/20,101@H
Stage: PROBLEM TO BE SOLVED: To provide a cleaning method of a plasma etching device that can clean up a foreign matter on a retention surface in a chamber without opening the chamber.SOLUTION: A cleaning method of a plasma etching device includes a cleaning jig setting step of covering a holding surface 21 of a holding table 20 in a chamber 10 with a cleaning jig 200 having an adhesive surface 209 having adherence properties or producing adherence properties due to an external stimulus on a su...