Japan, March 27 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD.' Other related details are as follows:

Application Number: JP,2023-056957

Category (FI): C07C211/63,C07C25/18,C07C381/12,C07C59/21,C07C62/18,C07C69/34,C07C69/38,C07D327/08,C07D333/76,C08F12/22,C08F12/24,C08F20/18,C09K3/00@K,G03F7/004,501,G03F7/004,503@A,G03F7/039,601,G03F7/20,501,G03F7/20,521

Stage: Grant (IP right granted following substantive examination.)

Filing Date: March 31, 2023

Publication Date: Oct. 15, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

Disclaimer: Curated by HT Syndication....