Japan, Sept. 9 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD.' Other related details are as follows:

Application Number: JP,2023-078335

Category (FI): G03F7/20,501,C08F212/02,C08F232/08,C08F20/30,C08F12/24,C07D221/14,C07D405/12,C07D327/08,C07D211/62,C07D333/76,G03F7/038,601,G03F7/004,501,G03F7/20,521,C08F220/10

Stage: Grant (IP right granted following substantive examination.)

Filing Date: May 11, 2023

Publication Date: Nov. 21, 2024

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

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