Japan, June 10 -- SHIN ETSU CHEM CO LTD has got intellectual property rights for 'CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD.' Other related details are as follows:

Application Number: JP,2023-102388

Category (FI): G03F7/20,501,G03F7/038,601,G03F7/004,503@A,C08F12/24,G03F7/20,521

Stage: Grant (IP right document published.)

Filing Date: June 22, 2023

Publication Date: Jan. 9, 2025

The original document can be viewed at: https://www.j-platpat.inpit.go.jp/p0100

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