MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202617094816 A) filed by Sumitomo Seika Chemicals Co. , Ltd. on August 05, 2026, for Water-Absorbing Resin Particle Production Method And Water-Absorbing Resin Particle.
Inventor includes Nishi, Hideyuki.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: Provided is a water-absorbing resin particle production method with which water-absorbing resin particles exhibiting less cracking with respect to collision are obtained, and which comprises a step for carrying out inverse suspension polymerization of a water-soluble ethylenically unsaturated monomer in a hydrocarbon dispersion medium to obtain polym...