Intellectual Property India Publishes Patent Application for Voltage Offset Reduction In 2d Material Based Hall Sensors

MUMBAI, India, June 22 -- Intellectual Property India has published a patent application (202641068850 A) filed by Indian Institute Of Science on June 01, 2026, for Voltage Offset Reduction In 2d Material Based Hall Sensors.

Inventors include Doddi, Koteswar; and Polley, Arup.

The application for the patent was published on June 12, 2026, under issue no. 24/2026.

Abstract: ABSTRACT VOLTAGE OFFSET REDUCTION IN 2D MATERIAL BASED HALL SENSORS Techniques for voltage offset reduction in a 2D 5 material-based Hall sensor are described. In an example, a bias current is sequentially routed through a plurality of spinning states of the Hall sensor exposed to a magnetic field, where each spinning state corresponds to a distinct configuration of a ...