Intellectual Property India Publishes Patent Application for Topology Optimized 3d Printed Nasal Airway Dilator

MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202641085492 A) filed by Chennai Institute Of Technology on July 13, 2026, for Topology Optimized 3d Printed Nasal Airway Dilator.

Inventors include Mr Murugan V; Niranjana N; and Or. V. Dhinakaran.

The application for the patent was published on August 07, 2026, under issue no. 32/2026.

Abstract: ABSTRACT Title: TOPOLOGY OPTIMIZED 3D PRINTED NASAL AIRWAY DILATOR 5 10 15 The titled invention discloses a topology optimized three- dimensional printed nasal airway dilator for improving airflow through the nasal passages and reducing snoring caused by nasal airway obstruction. The device includes a dual-leg nasal dilator structure (1) configured to main...