Intellectual Property India Publishes Patent Application for Textile Substrate With Structurally Integrated, Destructible Threads To Facilitate Material Separation

MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202647108378 A) filed by Climatex AG on September 09, 2026, for Textile Substrate With Structurally Integrated, Destructible Threads To Facilitate Material Separation.

Inventors include Baumeler, Alfred; and Cosatto, Maurizio.

The application for the patent was published on September 18, 2026, under issue no. 38/2026.

Abstract: The newly developed textile substrate (1) consists of three material groups and is produced by means of a weft and/or warp knitting technique. First threads (2) consist of one or more first (e.g. skin-friendly) materials (20) of a first material group, second threads (3) consist of one or more second (e.g. robust) materials ...