MUMBAI, India, June 19 -- Intellectual Property India has published a patent application (202647067581 A) filed by Asml Netherlands B. V. on May 29, 2026, for Systems And Methods For Motion Control In A Semiconductor Manufacturing Apparatus.
Inventors include Bustraan, Krijn, Frederik; Finney, Nathan, Robert; Delpuerto, Santiago E.; Huang, Yang-Shan; De Bruijn, Ron, Geeraard, Catharina; and Burroughs, John, Robert.
The application for the patent was published on June 05, 2026, under issue no. 23/2026.
Abstract: A motion control system is described. The motion control system includes a releasable coupling coupled to a fine positioning stage and a coarse positioning stage. The releasable coupling is configured to mechanically couple the fi...