Intellectual Property India Publishes Patent Application for Systems And Methods For Disproportionation Of Silicon Oxide For Anode Materials

MUMBAI, India, Aug. 12 -- Intellectual Property India has published a patent application (202617054670 A) filed by Albemarle Corporation on April 29, 2026, for Systems And Methods For Disproportionation Of Silicon Oxide For Anode Materials.

Inventors include Martinolich, Andrew J.; and Zhang, Yinzhi.

The application for the patent was published on August 07, 2026, under issue no. 32/2026.

Abstract: The present disclosure is directed to systems and methods of producing disproportionated silicon oxide composite particles. The disproportionated silicon monooxide composite particles can be produced by mixing an alkali metal salt and/or an alkaline earth metal salt, a carbon precursor, a liquid medium, and silicon monooxide particles to form ...