Intellectual Property India Publishes Patent Application for System For Chemical Vapour Infiltration And Deposition With Real-Time Substrate Mass-Gain Measurement

MUMBAI, India, Oct. 26 -- Intellectual Property India has published a patent application (202641122984 A) filed by Indian Space Research Organisation on October 14, 2026, for System For Chemical Vapour Infiltration And Deposition With Real-Time Substrate Mass-Gain Measurement.

Inventors include Dipoo Kumar; Anil Painuly; V Vinu Viswanath; Santhosh B; Deepak Kumar Agarwal; and N. Gomathi.

The application for the patent was published on October 23, 2026, under issue no. 43/2026.

Abstract: The present disclosure relates to a system (100) for chemical vapour infiltration and deposition (CVI/CVD) with real-time mass-gain measurement of a porous substrate (10). The system includes a reactor chamber (1) defining a reaction zone, a gas flow cont...