MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202631098914 A) filed by National Institute Of Technology, Rourkela on August 15, 2026, for System And Method For Noise-Based Defect Spectroscopy And Reliability Assessment Of Low- Dimensional Materials.
Inventors include Jagadis Prasad Nayak; Smrutirekha Sahoo; and Gopi Nath Daptary.
The application for the patent was published on September 18, 2026, under issue no. 38/2026.
Abstract: ABSTRACT SYSTEM AND METHOD FOR NOISE-BASED DEFECT SPECTROSCOPY AND RELIABILITY ASSESSMENT OF LOW-DIMENSIONAL MATERIALS The present invention relates to an integrated noise-based electrical defect spectroscopy system and characterization framework for non-destructive ...