MUMBAI, India, Aug. 10 -- Intellectual Property India has published a patent application (202541048649 A) filed by Insilicon Solutions India Private Limited on May 20, 2025, for System And Method For Measurement And Characterization Of Nano-Particulate Contamination In Semiconductor Process Chemicals.
Inventors include Blesson Varghese; Pranesh Muralidhar; Shraddha Thakur; Midathala Yogesh; and Ashutosh Shrikant Bhabhe.
The application for the patent was published on July 31, 2026, under issue no. 31/2026.
Abstract: ABSTRACT A method (100) of measuring and characterizing nanoparticulate contamination in chemicals is described. The method (100) includes the steps of providing (102) an engineered doped or undoped semiconductor substrate wi...