Intellectual Property India Publishes Patent Application for Sustainable Design Guideline Framework (sdgf) For Support-Free Geometry Redesign In Material Extrusion Additive Manufacturing

MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202641108620 A) filed by Easwari Engineering College; and Srm Institute Of Science And Technology, Ramapuram Campus on September 10, 2026, for Sustainable Design Guideline Framework (sdgf) For Support-Free Geometry Redesign In Material Extrusion Additive Manufacturing.

Inventors include Haaroon Muhammad S; Akshaya S. R; and Bini Palas P.

The application for the patent was published on September 18, 2026, under issue no. 38/2026.

Abstract: This invention introduces a Sustainable Design Guideline Framework (SDGF) — a design-stage method for cutting support structures in Material Extrusion 3D printing. It scans a 3D CAD model to spot geometric feature...