MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202647101952 A) filed by Kokusai Electric Corporation on August 24, 2026, for Substrate Processing Method, Method For Manufacturing Semiconductor Device, Program, And Substrate Processing Device.
Inventors include Nakazawa Hiroki; Ishibashi Kiyohisa; and Ogawa Arito.
The application for the patent was published on September 18, 2026, under issue no. 38/2026.
Abstract: According to the present invention, a film containing a first element and a second element is formed on a substrate by performing: a first step for forming a first layer containing the first element by performing, a first number of times, a cycle that includes (a-1) a step for supplyi...