Intellectual Property India Publishes Patent Application for Substrate Processing Method, Method For Manufacturing Semiconductor Device, Program, And Substrate Processing Device

MUMBAI, India, July 13 -- Intellectual Property India has published a patent application (202617073236 A) filed by Kokusai Electric Corporation on June 12, 2026, for Substrate Processing Method, Method For Manufacturing Semiconductor Device, Program, And Substrate Processing Device.

Inventors include Matsuno, Yutaka; Seino, Atsuro; and Ogawa, Arito.

The application for the patent was published on July 10, 2026, under issue no. 28/2026.

Abstract: Provided is a technique with which it is possible to control the orientation of crystal particles in a film (or in a layer). The method includes a step for forming a film on a substrate by performing a cycle for forming layers on the substrate a prescribed number of times by performing (a) a step...