Intellectual Property India Publishes Patent Application for Selective Deposition Of Aluminum-Containing Dielectric Material On Dielectric Over Metals Utilizing Silanes

MUMBAI, India, Sept. 28 -- Intellectual Property India has published a patent application (202647111493 A) filed by Versum Materials Us, LLC on September 17, 2026, for Selective Deposition Of Aluminum-Containing Dielectric Material On Dielectric Over Metals Utilizing Silanes.

Inventors include Cheng, Lanxia; Hoang, Son; Zope, Bhushan; and Lei, Xinjian.

The application for the patent was published on September 25, 2026, under issue no. 39/2026.

Abstract: A method for selectively passivating a substrate, wherein the substrate includes at a first surface comprising a first metal and at least a second surface comprising a second metal, preferably a metal nitride, and a third surface comprising a dielectric material. The method includes the s...