MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202647127195 A) filed by Toyo Seikan Group Holdings, Ltd. on October 26, 2026, for Porous Silica Doped With Multiple Types Of Metals And Containing High Copper Content.
Inventors include Kimura Samizo Mariko; Ikeda Kazuho; Yagami Genta; Ohashi Kazuaki; and Ikutame Daisuke.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: The present invention addresses the problem of providing a porous silica exhibiting an excellent deodorizing effect with respect to sulfur-containing odors. As a means for solving said problem, the porous silica according to the present invention is doped with multiple types of meta...