MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202647124246 A) filed by Nof Corporation on October 16, 2026, for Polyether, Cosmetic Base, And Cosmetic.
Inventors include Murakami, Taiga; and Sekiguchi, Koji.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: The present invention provides a polyether represented by formula (1) (the symbols of which are defined in the description). This polyether is suited to various applications, including a cosmetic base.
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