MUMBAI, India, Aug. 24 -- Intellectual Property India has published a patent application (202641098193 A) filed by Indian Institute Of Technology Madras Iit Madras on August 13, 2026, for Method For Producing Large-Area Free-Standing Ultrathin Films.
Inventors include Satyesh Kumar Yadav; Daljin J; Lasya Peela; Pandiri Sirish; Seepana Pardhasaeeswara Rao; and Gandham Tirumala Siva Pavan.
The application for the patent was published on August 21, 2026, under issue no. 34/2026.
Abstract: ABSTRACT METHOD FOR PRODUCING LARGE-AREA FREE-STANDING ULTRATHIN FILMS The present invention relates to a method for preparing continuous, large-area, free-standing ultrathin films. The method comprises providing a substrate (100), depositing a first metal...