MUMBAI, India, Nov. 2 -- Intellectual Property India has published a patent application (202631126714 A) filed by National Institute Of Technology Jamshedpur on October 23, 2026, for Method For Maskless Selective-Area Circuit Patterning On A Polyethylene Terephthalate (pet) Foil Through Electroless Deposition.
Inventors include Budhram Boipai; and Tushar Banerjee.
The application for the patent was published on October 30, 2026, under issue no. 44/2026.
Abstract: The present invention generally relates to a method for maskless selective-area circuit patterning on a polyethylene terephthalate (PET) substrate. The method includes mechanically roughening the PET substrate to increase surface roughness, followed by sequential organic solvent...