Intellectual Property India Publishes Patent Application for Method And System For Controlled Zno Thin Films

MUMBAI, India, Oct. 12 -- Intellectual Property India has published a patent application (202611102546 A) filed by Nims University Rajasthan, Jaipur on August 25, 2026, for Method And System For Controlled Zno Thin Films.

Inventors include Rajesh Kumar; and Dr. Sudhir Kumar Mishra.

The application for the patent was published on October 09, 2026, under issue no. 41/2026.

Abstract: An oxygen-controlled RF magnetron sputtering system (100) and method (200) for depositing zinc oxide (ZnO) thin films are disclosed. The system comprises a vacuum deposition chamber (101), an RF magnetron sputtering cathode assembly (102), a substrate holder assembly (103), a gas delivery system (104), a pressure control unit (105), an RF power supply (106), a ...