Intellectual Property India Publishes Patent Application for Macro Electric Discharge Additive Manufacturing System And Method Using Magnetic Plasma Stabilization And Optimized Dielectric

MUMBAI, India, Sept. 22 -- Intellectual Property India has published a patent application (202611021781 A) filed by National Institute Of Technology, Delhi; and Dr. Leeladhar Nagdeve on February 24, 2026, for Macro Electric Discharge Additive Manufacturing System And Method Using Magnetic Plasma Stabilization And Optimized Dielectric.

Inventors include Dr. Leeladhar Nagdeve; Dr. Ashok Kumar Dewangan; Mr Ganesh Singh Yadav; Narasimhudu Sreeramula; and Ankush Katheria.

The application for the patent was published on September 18, 2026, under issue no. 38/2026.

Abstract: A MEDA manufacturing system and method are disclosed for high-rate, layer-by-layer fabrication of dense, three-dimensional metallic components. Conventional EDD is limited ...