Intellectual Property India Publishes Patent Application for Low-Temperature In-Situ Growth And Metal Decoration Of Fiber-Anchored Nanowire Architectures On Flexible Textile Substrates

MUMBAI, India, Oct. 5 -- Intellectual Property India has published a patent application (202631114241 A) filed by Assam Down Town University on September 24, 2026, for Low-Temperature In-Situ Growth And Metal Decoration Of Fiber-Anchored Nanowire Architectures On Flexible Textile Substrates.

Inventors include Mr. Devabrata Sarmah; Dr. Pulakesh Chetia; Dr. Arnab Kr. Sarkar; Ms. Nabanita Daimary; Prof. Sunandan Baruah; and Ms. Nairika Deka.

The application for the patent was published on October 02, 2026, under issue no. 40/2026.

Abstract: LOW-TEMPERATURE IN-SITU GROWTH AND METAL DECORATION OF FIBER-ANCHORED NANOWIRE ARCHITECTURES ON FLEXIBLE TEXTILE SUBSTRATES Abstract of the Invention The present invention relates to a low-temperature, b...