MUMBAI, India, Aug. 10 -- Intellectual Property India has published a patent application (202647090946 A) filed by Asml Netherlands B. V. on July 27, 2026, for Gas Flow Reallocation In Light Source.
Inventors include Frenzel, Alex, James; and Braaksma, Niels.
The application for the patent was published on July 31, 2026, under issue no. 31/2026.
Abstract: An extreme ultraviolet (EUV) system includes a vessel for generating radiation, a mirror, a gas flow assembly, and an exhaust. The system provides a first gas flow path in the vessel when the system is generating EUV radiation. The system provides a second gas flow path in the vessel when the system is not generating EUV radiation. The system can switch between the first gas flow path a...