Intellectual Property India Publishes Patent Application for Electrolithography (elg) System For High-Resolution Large-Area Patterning And Method Thereof

MUMBAI, India, July 24 -- Intellectual Property India has published a patent application (202521048093 A) filed by Indian Institute Of Science Education And Research on May 19, 2025, for Electrolithography (elg) System For High-Resolution Large-Area Patterning And Method Thereof.

Inventors include Dr. Santanu Talukder; and Abhishek Kumar.

The application for the patent was published on July 17, 2026, under issue no. 29/2026.

Abstract: The present invention relates to electrolithography (ELG) system for high-resolution large-area patterning and method thereof. The system 100 comprises a substrate 102, a static probe 104, a scanning probe 106, a plurality of imaging devices 108, an electro- mechanical assembly 110, a reference framework 11...